概述：本设备适用于半导体工艺中对硅片周边进行湿法化学腐蚀形成均匀一致的斜角，本超声波清洗机设备技术先进，适用于规模生产。
设备是由电气控制，机架，箱体，清洗槽，机械手，伺服系统，层流净化，管路部分组成。
清洗槽是由去离子水洗槽，有机溶剂槽，酸槽，或碱槽构成。
管路部分为保证工作介质的洁净和避免杂质析出，特采用进口气动阀，PFA,PVDF,管道，全氟循环系统。
除装片和取片外，其余工艺均可自动完成。
电控部分：人机界面为触摸屏，方便美观。。。。
Silicon corrosion machine output presentation:
Overview: This equipment is applied into the semiconductor process it is in the formation of uniform and oblique angle while
doing the wetting chemical corrosion toward the perimeter of the silicon ,this equipment is technologically advanced, applicable to the scale of production. The equipment is controlled by the electric and builtup with racks, boxes, cleaning slot, manipulator, servo system, laminar flow purification, and pipeline components.
Cleaning slot is rinsed by the deionized water, it is composed by the organic solvent shafts, acid tank, oralkaline slot.
To ensure the cleaning of the work medium and avoid precipitation of the impurities ,specially use the import pneumatic valves, PFA, PVDFpipelines, perfluorocarbons circulatory system. In addition to equipping film and popping out film, the other process can be automatically completed .electronically controlled: human-computer interface for the touch screen,convenient and aesthetic.